Method for improving a process for a patterning process
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United States of America Patent
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May 7, 2024
Grant Date -
Jul 8, 2021
app pub date -
May 14, 2019
filing date -
May 14, 2019
priority date (Note) -
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Abstract
A method for improving a process model for a patterning process, the method including obtaining a) a measured contour from an image capture device, and b) a simulated contour generated from a simulation of the process model. The method also includes aligning the measured contour with the simulated contour by determining an offset between the measured contour and the simulated contour. The process model is calibrated to reduce a difference, computed based on the determined offset, between the simulated contour and the measured contour.
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