Fabrication process for A/M/X materials

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United States of America Patent

PATENT NO 11976227
APP PUB NO 20210230480A1
SERIAL NO

17259712

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Abstract

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The invention relates to a process for producing a crystalline A/M/X material, which crystalline A/M/X material comprises a compound of formula [A]a[M]b[X]c wherein: [A] comprises one or more A cations; [M] comprises one or more M cations which are metal or metalloid cations; [X] comprises one or more X anions; a is a number from 1 to 6; b is a number from 1 to 6; and c is a number from 1 to 18. The process is capable of producing crystalline A/M/X materials while precisely controlling their stoichiometry, leading to products with finely tunable optical properties such as peak emission wavelength. The invention also relates to process for producing a thin film comprising the crystalline A/M/X material of the invention, and to a thin film obtainable by the process of the invention. An optoelectronic device comprising the thin film is also provided.

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Patent Owner(s)

Patent OwnerAddress
OXFORD UNIVERSITY INNOVATION LIMITEDBUXTON COURT 3 WEST WAY OXFORD OX2 0JB

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sakai, Nobuya Oxford, GB 27 319
Snaith, Henry James Oxford, GB 33 176
Wenger, Bernard Oxford, GB 13 39

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