Methods for modeling of a design in reticle enhancement technology

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United States of America Patent

PATENT NO 11972187
APP PUB NO 20230205961A1
SERIAL NO

18175313

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Abstract

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Methods for reticle enhancement technology include representing a target wafer pattern or a predicted wafer pattern as a smooth function captured as a function sample array (FSA). The FSA is an array of sampled values of the smooth function, which is a continuous differentiable function. Methods also include providing a continuous tone mask (CTM), wherein the CTM is used to produce the predicted wafer pattern, the predicted wafer pattern spanning an entire design area.

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Patent Owner(s)

Patent OwnerAddress
D2S INC4040 MOORPARK AVE SUITE 250 SAN JOSE CA 95117

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ungar, P Jeffrey Belmont, US 45 572

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