Systems and methods for reducing resist model prediction errors
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United States of America Patent
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Apr 23, 2024
Grant Date -
Nov 5, 2020
app pub date -
Dec 20, 2018
filing date -
Dec 22, 2017
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Abstract
A method for calibrating a resist model. The method includes: generating a modeled resist contour of a resist structure based on a simulated aerial image of the resist structure and parameters of the resist model, and predicting a metrology contour of the resist structure from the modeled resist contour based on information of an actual resist structure obtained by a metrology device. The method includes adjusting one or more of the parameters of the resist model based on a comparison of the predicted metrology contour and an actual metrology contour of the actual resist structure obtained by the metrology device.
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