Plasma generating device

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11961730
APP PUB NO 20230187195A1
SERIAL NO

17912226

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A plasma generating device includes: a chamber which is equipped with a dielectric wall structure and into which sample gas to be measured flows; an RF supplying mechanism that generates plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure; and a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber. The RF supplying mechanism may include an RF field forming unit disposed in a first direction with respect to the chamber and the first electrode may include an electrode disposed in a second direction with respect to the chamber.

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Patent Owner(s)

  • ATONARP INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Takahashi, Naoki Tokyo, JP 418 3234

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