Substrate processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11961714
APP PUB NO 20220285132A1
SERIAL NO

17334855

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Abstract

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A substrate processing apparatus comprises a chamber member that defines an interior volume that has an aspect ratio. The chamber member comprises a pair of laterally opposing inlet walls and a loading port. Each of the pair of laterally opposing inlet walls has an inlet port configured to receive output from a remote plasma source. The loading port is arranged between the pair of inlet walls, configured to allow passage of a substrate into the interior volume.

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Patent Owner(s)

Patent OwnerAddress
LINCO TECHNOLOGY CO LTDNO 16 KEYUAN 1ST RD LINCUO VIL XITUN DIST TAICHUNG CITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huang, Yi-Yuan Taichung, TW 9 3
Liu, Yi-Cheng Taichung, TW 54 347

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