Meta-lens structure and method of fabricating the same

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United States of America

PATENT NO 11960051
SERIAL NO

17292124

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Abstract

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Various embodiments may provide a method of fabricating a meta-lens structure. The method may include forming a first dielectric layer in contact with a silicon wafer. The method may also include forming a second dielectric layer in contact with the first dielectric layer. A refractive index of the second dielectric layer may be different from a refractive index of the first dielectric layer. The method may further include, in patterning the second dielectric layer. The method may additionally include removing at least a portion of the silicon wafer to expose the first dielectric layer.

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Patent Owner(s)

Patent OwnerAddress
AGENCY FOR SCIENCE TECHNOLOGY AND RESEARCH1 FUSIONOPOLIS WAY #20-10 CONNEXIS NORTH TOWER SINGAPORE 138632

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dong, Yuan Singapore, SG 31 359
Gu, Alex Yuandong Singapore, SG 14 136
Hu, Ting Singapore, SG 15 36
Tseng, Chih-Kuo Singapore, SG 8 810
Xu, Zhengji Singapore, SG 1 1
Zhu, Shiyang Singapore, SG 15 125

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