Method for making photolithography mask plate

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11947261
APP PUB NO 20210132500A1
SERIAL NO

17150220

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Abstract

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A method of making photolithography mask plate is provided. The method includes: providing a carbon nanotube layer on a substrate; depositing a chrome layer on the carbon nanotube layer, wherein the chrome layer includes a first patterned chrome layer and a second patterned chrome layer, the first patterned chrome layer is located on the carbon nanotube layer, and the second patterned chrome layer is deposited on the substrate corresponding to holes of the carbon nanotube layer; transferring the carbon nanotube layer with the first patterned chrome layer thereon from the substrate to a base, and the carbon nanotube layer being in contact with the base; and depositing a cover layer on the first patterned chrome layer.

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Patent Owner(s)

Patent OwnerAddress
HON HAI PRECISION INDUSTRY CO LTD66 CHUNG SHAN ROAD TU-CHENG DIST NEW TAIPEI
TSINGHUA UNIVERSITY100084 TSINGHUA YUAN BEIJING HAIDIAN DISTRICT BEIJING CITY BEIJING CITY 100084

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
An, Dong Beijing, CN 42 609
Chen, Mo Beijing, CN 106 604
Fan, Shou-Shan Beijing, CN 1514 11778
Jin, Yuan-Hao Beijing, CN 125 259
Li, Qun-Qing Beijing, CN 328 1764
Zhang, Li-Hui Beijing, CN 58 249

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