Method for making photolithography mask plate

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United States of America Patent

PATENT NO 11947255
APP PUB NO 20210165329A1
SERIAL NO

17150229

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Abstract

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A method of making photolithography mask plate is provided. The method includes: providing a carbon nanotube composite structure, wherein the carbon nanotube composite structure comprises a carbon nanotube layer and a chrome layer coated on the carbon nanotube layer; locating the carbon nanotube composite structure on a substrate to expose partial surfaces of the substrate; and depositing a cover layer on the carbon nanotube composite structure.

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Patent Owner(s)

Patent OwnerAddress
HON HAI PRECISION INDUSTRY CO LTDNO 66 JHONGSHAN RD TUCHENG DIST NEW TAIPEI CITY 236038
TSINGHUA UNIVERSITY100084 NO 1 TSINGHUA YUAN BEIJING HAIDIAN DISTRICT BEIJING CITY BEIJING CITY 100084

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
An, Dong Beijing, CN 42 609
Chen, Mo Beijing, CN 106 604
Fan, Shou-Shan Beijing, CN 1514 11778
Jin, Yuan-Hao Beijing, CN 125 259
Li, Qun-Qing Beijing, CN 328 1764
Zhang, Li-Hui Beijing, CN 58 249

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