Dielectric material, device comprising dielectric material, and method of preparing dielectric material

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United States of America Patent

PATENT NO 11946154
APP PUB NO 20210198801A1
SERIAL NO

17126902

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Abstract

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Provided are a dielectric material, a device including the dielectric material, and a method of preparing the dielectric material, in which the dielectric material may include: a layered perovskite compound, wherein the layered perovskite compound may include at least one selected from a Dion-Jacobson phase, an Aurivillius phase, and a Ruddlesden-Popper phase, a temperature coefficient of capacitance (TCC) of a capacitance at 200° C. with respect to a capacitance at 40° C. may be in a range of about −15 percent (%) to about 15%, and a permittivity of the dielectric material may be 200 or greater in a range of about 1 kilohertz (kHz) to about 1 megahertz (MHz).

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ebina, Yasuo Ibaraki, JP 8 59
Jo, Giyoung Suwon-si, KR 15 13
Jung, Dohwon Seoul, KR 2 2
Kim, Hyungjun Suwon-si, KR 145 1302
Kwak, Chan Yongin-si, KR 104 427
Lee, Changsoo Seoul, KR 51 169
Sasaki, Takayoshi Ibaraki, JP 58 681
Taniguchi, Takaaki Ibaraki, JP 13 29

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