Method of fabricating reticle
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United States of America Patent
Stats
-
Mar 26, 2024
Grant Date -
Aug 26, 2021
app pub date -
May 7, 2021
filing date -
Oct 29, 2014
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method includes receiving a device design layout and a scribe line design layout surrounding the device design layout. The device design layout and the scribe line design layout are rotated in different directions. An optical proximity correction (OPC) process is performed on the rotated device design layout and the rotated scribe line design layout. A reticle includes the device design layout and the scribe line design layout is formed after performing the OPC process.
First Claim
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International Classification(s)
- 2021 Application Filing Year
- H01L Class
- 28775 Applications Filed
- 15216 Patents Issued To-Date
- 52.88 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 1 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Sep 26, 2027 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Sep 26, 2031 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Sep 26, 2035 |
