Mask protective module, pellicle having the same, and lithography apparatus having the same

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United States of America Patent

PATENT NO 11940726
APP PUB NO 20220334467A1
SERIAL NO

17851580

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Abstract

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A lithography apparatus comprises a light source for emitting light; a mask mounting zone where a mask for reflecting the light is disposed; and a mask protective module disposed on the mask to transmit the light from the light source toward the mask. The mask protective module comprises a frame and a membrane supported by the frame, wherein the membrane includes a penetration region for transmitting the light and a peripheral region of which a light transmittance is lower than that of the penetration region.

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Patent Owner(s)

Patent OwnerAddress
INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY222 WANGSHIPRI-RO SEONGDONG-GU SEOUL 04763

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ahn, Jinho Seoul, KR 8 17
Hong, Seongchul Seoul, KR 13 26
Kim, Jung Hwan Seoul, KR 112 856

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