Photolithography mask and photolithography system comprising said photolithography mask

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United States of America

PATENT NO 11934091
SERIAL NO

18263105

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Abstract

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A photolithography mask (10) is provided, said photolithography mask (10) including a plate (15) or an empty frame matrix, a surface of the plate (15) or empty frame matrix including an array of micro-pixels (20), wherein each micro-pixel (20) is independently controllable using an on-board micro-controller (25) in such a manner that a pattern can be generated with the array of micro-pixels (20).

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Patent Owner(s)

Patent OwnerAddress
TECHNOLOGIES DIGITHO INC51 RUE D'ALMA GRANBY J2H 2B1

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Beaudry, Richard Granby, CA 8 78

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