Phase shift blankmask and photomask for EUV lithography

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United States of America Patent

PATENT NO 11927880
APP PUB NO 20220269160A1
SERIAL NO

17572390

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Abstract

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A blankmask for extreme ultraviolet lithography includes a substrate, a reflective layer formed on the substrate, and a phase shift layer formed on the reflective layer. The phase shift layer contains niobium (Nb), and is made of a material containing one of tantalum (Ta), chromium (Cr), and ruthenium (Ru). A phase shift layer containing Nb and Ta has a relative reflectance of 5 to 20%, a phase shift layer containing Nb and Cr has a relative reflectance of 9 to 15%, and a phase shift layer containing Nb and Ru has a relative reflectance of 20% or more. The phase shift layer has a phase shift amount of 170 to 230°, and has a surface roughness of 0.5 nmRMS or less. It is possible to obtain excellent resolution when finally manufacturing a pattern of 7 nm or less by using a photomask manufactured using such a blankmask.

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Patent Owner(s)

Patent OwnerAddress
S&S TECH CO LTDDAEGU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Yong-Dae Daegu-si, KR 11 58
Park, Min-Kwang Daegu-si, KR 4 0
Woo, Mi-Kyung Daegu-si, KR 5 0
Yang, Chul-Kyu Daegu-si, KR 25 37

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