Polyimide substrate, manufacturing method thereof, and display substrate having same

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United States of America

PATENT NO 11926704
SERIAL NO

17261427

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Abstract

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A polyimide substrate, a manufacturing method thereof, and a display substrate having same are disclosed. The method for manufacturing the polyimide substrate comprises steps of: providing a diamine containing a dioxazole structure; polymerizing a fluorine-containing dianhydride with the diamine containing the dioxazole structure to form a polyamic acid containing oxazole and fluorine; and cyclodehydrating the polyamic acid containing oxazole and fluorine to produce a polyimide containing oxazole and fluorine, followed by forming the polyimide substrate by film formation of the polyimide containing oxazole and fluorine. Thus, a light transmission performance of the polyimide substrate is improved.

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Patent Owner(s)

Patent OwnerAddress
WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO LTD305 ROOM BUILDING C5 BIOLAKE OF OPTICS VALLEY NO 666 GAOXIN AVENUE WUHAN EAST LAKE HIGH-TECH DEVELOPMENT ZONE WUHAN HUBEI 430079

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Wang, Yamin Wuhan, CN 73 415

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