Carbon-doped silicon dioxide glass and methods of manufacturing thereof

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United States of America Patent

PATENT NO 11919805
APP PUB NO 20210214267A1
SERIAL NO

15734078

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Abstract

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A silica-based substrate includes a glass phase and a dispersed phase having carbon, such that the silica-based substrate has a thickness of at least 10 gm. Also disclosed is a method of forming a silica-based substrate, the method including contacting a porous silica soot preform with an organic solution having at least one hydrocarbon precursor to form a doped silica soot preform and heating the doped silica soot preform in an inert atmosphere to form the silica-based substrate.

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Patent OwnerAddress
CORNING INCORPORATEDONE RIVERFRONT PLAZA CORNING NY 14831

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gu, Yunfeng Painted Post, US 45 275
LeBlond, Nicolas Painted Post, US 21 118
Li, Ming-Jun Horseheads, US 376 5535
Stone, Jeffery Scott Addison, US 22 104
Zhang, Haitao Ithaca, US 173 1178

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