Controlling porosity of an interference lithography process by fine tuning exposure time

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United States of America Patent

PATENT NO 11914304
APP PUB NO 20230045339A1
SERIAL NO

17394926

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Abstract

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A method to control the density of a three-dimensional photonic crystal template involves changing the irradiation time from at least four laser beams to yield a periodic percolating matrix of mass and voids free of condensed matter from a photoresist composition. The photoresist composition includes a photoinitiator at a concentration where the dose or irradiation is controlled by the irradiation time and is less than the irradiation time that would convert all photoinitiator to initiating species such that the density of the three-dimensional photonic crystal template differs for different irradiation times. A deposition of reflecting or absorbing particles can be patterned on the surface of the photoresist composition to form a template with varying densities above different areas of the substrate.

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Patent Owner(s)

Patent OwnerAddress
TOYOTA JIDOSHA KABUSHIKI KAISHA1 TOYOTA-CHO TOYOTA-SHI AICHI-KEN 471-8571

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Braun, Paul Vannest Champaign, US 8 70
Joshi, Shailesh N Ann Arbor, US 187 923
Lan, Kai-Wei Champaign, US 9 3
Lohan, Danny J Ann Arbor, US 32 20
Singhal, Gaurav Champaign, US 16 5

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