Method and device for plating a recess in a substrate

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United States of America Patent

PATENT NO 11908698
SERIAL NO

17491692

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Abstract

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The invention relates to a method for plating a recess in a substrate, a device for plating a recess in a substrate and a system for plating a recess in a substrate comprising the device. The method for plating a recess in a substrate comprises the following steps:

    Providing a substrate with a substrate surface comprising at least one recess,applying a replacement gas to the recess to replace an amount of ambient gas in the recess to at least partially clear the recess from the ambient gas,applying a processing fluid to the recess, wherein the replacement gas dissolves in the processing fluid to at least partially clear the recess from the replacement gas, andplating the recess.

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Patent Owner(s)

Patent OwnerAddress
SEMSYSCO GMBH5020 SALZBURG

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Engesser, Philipp Villach, AT 12 88
Gleissner, Andreas Döbriach, AT 44 390
Knoll, Oliver Salzburg, AT 5 3
Markut, Franz St. Georgen, AT 6 3
Okorn-Schmidt, Harald Klagenfurt, AT 14 65
Wirnsberger, Thomas Seeboden, AT 18 389

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