Optical system in particular for microlithography

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United States of America Patent

PATENT NO 11906753
APP PUB NO 20210231965A1
SERIAL NO

17229167

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Abstract

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An optical system, in particular for microlithography, includes a beam splitter, which has at least one light entry surface. The beam splitter is arranged in the optical system so that the angles of incidence with respect to the surface normal which occur at the light entry surface during operation of the optical system lie in the range of 45°±5°. The beam splitter is produced in [110] the crystal cut.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kraus, Johannes Theilheim, DE 12 24

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