Support table for a lithographic apparatus, method of loading a substrate, lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 11898601
SERIAL NO

17407778

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Abstract

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A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VDE RUN 6501 VELDHOVEN NL - 5504 DR

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baggen, Mark Constant Johannes Eindhoven, NL 13 38
Soethoudt, Abraham Alexander Eindhoven, NL 20 55
Tromp, Siegfried Alexander Knegsel, NL 25 120
Van, De Poel Jan Pieter Hendrik Ido Ambacht, NL 3 3
Verweij, Antonie Hendrik Dussen, NL 9 13

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