Monolayer deposition of nanoparticles

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United States of America Patent

PATENT NO 11890640
APP PUB NO 20230095274A1
SERIAL NO

17794429

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Abstract

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Methods of forming a monolayer of nanoparticles are described. The method may include forming an activated surface on a substrate. Methods may also include contacting the activated surface with a fluid including nanoparticles. Methods may further include forming a plurality of monolayers in the liquid on the activated surface. The plurality of nanoparticles may include a first monolayer of nanoparticles bonded to the activated surface. The plurality of nanoparticles may include a second monolayer of nanoparticles bonded to the first monolayer of nanoparticles. The bond strengths between a nanoparticle and the underlying substrate, between adjacent nanoparticles, and between nanoparticles of adjacent monolayers may be related by a specific relationship. The method may also include removing monolayers of the plurality of monolayers while retaining the first monolayer to form the substrate with the first monolayer. Systems for performing the methods and substrates resulting from the methods are also described.

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Patent Owner(s)

Patent OwnerAddress
NANOCLEAR TECHNOLOGIES INC145 N ALTADENA DRIVE SUITE 200 PASADENA CA 91107

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Greer, Harold Frank Los Angeles, US 18 151
Kapadia, Rehan Los Angeles, US 9 300
Saenz, Angelica Pasadena, US 2 0
Webber, David Los Angeles, US 7 381

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