Method and apparatus for depositing a material

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United States of America Patent

PATENT NO 11875980
SERIAL NO

17139445

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Abstract

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A method is for depositing a dielectric material on to a substrate in a chamber by pulsed DC magnetron sputtering with a pulsed DC magnetron device which produces one or more primary magnetic fields. In the method, a sputtering material is sputtered from a target, wherein the target and the substrate are separated by a gap in the range 2.5 to 10 cm and a secondary magnetic field is produced within the chamber which causes a plasma produced by the pulsed DC magnetron device to expand towards one or more walls of the chamber.

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Patent Owner(s)

Patent OwnerAddress
SPTS TECHNOLOGIES LIMITEDNEWPORT

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Burgess, Stephen R Gwent, GB 19 150
Cook, Daniel Newport, GB 74 533
Haymore, Scott Newport, GB 15 13
Hyndman, Rhonda Newport, GB 13 16
Lima, Eduardo Paulo Gwent, AE 2 2
Rastogi, Amit Newport, GB 8 16
Rich, Paul Gloucestershire, GB 19 77
Widdicks, Clive L Bristol, GB 4 11

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