Substrate liquid processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11869780
APP PUB NO 20190080938A1
SERIAL NO

16126106

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Abstract

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A substrate liquid processing apparatus includes a processing liquid storage unit configured to store a processing liquid therein; a processing liquid drain unit configured to drain the processing liquid from the processing liquid storage unit; and a control unit. The control unit performs a first control in a constant concentration mode in which a concentration of the processing liquid in the processing liquid storage unit is regulated to a predetermined set concentration and a second control in a concentration changing mode in which the concentration of the processing liquid is changed. In the second control, a set concentration after concentration change is compared with a set concentration before the concentration change, and when the set concentration after the concentration change is lower, the control unit controls the processing liquid drain unit to start draining of the processing liquid.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aratake, Hidemasa Koshi, JP 6 14
Harada, Jiro Koshi, JP 21 181
Kawazu, Takahiro Koshi, JP 6 9
Kuroda, Osamu Koshi, JP 91 1551
Nagai, Takashi Koshi, JP 94 884
Sato, Hideaki Koshi, JP 206 3212
Tsuchiya, Takafumi Koshi, JP 9 57

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