Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same

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United States of America Patent

PATENT NO 11866554
APP PUB NO 20230303775A1
SERIAL NO

18032192

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Abstract

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To provide a new silicon-containing polymer making it possible to form a cured film has features that its residual stress is small and crack resistance is high. A polycarbosilazane having particular cyclic structures.

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Patent Owner(s)

Patent OwnerAddress
MERCK ELECTRONICS KGAAFRANKFURTER STRASSE 250 DARMSTADT 64293

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Okamura, Toshiya Kakegawa, JP 9 9
Okayasu, Tetsuo Kakegawa, JP 12 41
Suzuki, Katsuchika Kakegawa, JP 4 14
Vom, Stein Thorsten Darmstadt, DE 7 6

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