System and method for dissipating workpiece charge build up
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United States of America Patent
Stats
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Jan 2, 2024
Grant Date -
Nov 16, 2023
app pub date -
May 10, 2022
filing date -
May 10, 2022
priority date (Note) -
In Force
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Abstract
A system and method for reducing charge on a workpiece disposed on a platen is disclosed. The system includes an ionizer to generate ionized gas from the source of backside gas. The ionizer may be used to introduce ionized gas into the backside gas channels of the platen. A controller is used to selectively allow backside gas and/or ionized gas into the backside gas channels. In certain embodiments, the platen also includes an exhaust channel in communication with an exhaust valve to ensure that the pressure within the volume between the top surface of the platen and the workpiece is maintained in a desired range. In one embodiment, the system includes a valving system in communication with the source of backside gas and also in communication with the ionizer. In another embodiment, the amount of ionization performed by the ionizer is programmable.

First Claim
Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
APPLIED MATERIALS INC | 3050 BOWERS AVENUE SANTA CLARA CA 95054 |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Chen, Qin | South Hamilton, US | 78 | 509 |
Morrell, David | Gloucester, US | 14 | 22 |
Sun, Dawei | Lynnfield, US | 49 | 49 |
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