Mask defect prevention
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 2, 2024
Grant Date -
Nov 3, 2022
app pub date -
Jun 30, 2022
filing date -
Aug 31, 2020
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A photolithographic mask assembly according to the present disclosure accompanies a photolithographic mask. The photolithographic mask includes a capping layer over a substrate and an absorber layer disposed over the capping layer. The absorber layer includes a first main feature area, a second main feature area, and a venting feature area disposed between the first main feature area and the second main feature area. The venting feature area includes a plurality of venting features.
First Claim
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International Classification(s)
- 2022 Application Filing Year
- G03F Class
- 1894 Applications Filed
- 526 Patents Issued To-Date
- 27.78 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G03F Class
- 0 % this patent is cited more than
- 1 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Jul 2, 2027 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jul 2, 2031 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jul 2, 2035 |
