Method for manufacturing a block copolymer of polyamide acid

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United States of America Patent

PATENT NO 11859038
APP PUB NO 20210087319A1
SERIAL NO

16936204

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Abstract

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A block copolymer of polyamide acid includes a first polyamide acid and a second polyamide acid alternately connected. The first polyamide acid is made by first dianhydride monomers and second diamine monomers. The second polyamide acid is made by second dianhydride monomers and first diamine monomers. Each first dianhydride monomer is

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Patent OwnerAddress
ZHEN DING TECHNOLOGY CO LTDNO 6 LANE 28 SAN HO RD SAN SHI VILLAGE TAYUAN TAOYUAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsiang, Shou-Jui Tayuan, TW 30 27
Huang, Wei-Hsin Taoyuan, TW 11 32
Lee, Kuan-Wei Taoyuan, TW 27 69
Su, Szu-Hsiang Taoyuan, TW 20 2
Wu, Pei-Jung Taoyuan, TW 15 8

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