System for processing substrate
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 26, 2023
Grant Date -
Nov 18, 2021
app pub date -
Apr 29, 2021
filing date -
May 13, 2020
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A substrate processing system capable of setting a stable reference ground level for electrical components while handling electrostatic discharge (ESD) is provided. The substrate processing system includes a first ground bar connected to a building ground; and a second ground bar connected to the building ground and physically separated from the first ground bar, wherein the first ground bar is connected to a first electrical component to set a ground level of the first electrical component, wherein the second ground bar is dedicated to a charged component, and the second ground bar is connected to the first charged component to set a path of the electrostatic discharge current generated by the first charged component.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SEMES CO LTD | CHUNGNAM SOUTH KOREA JEOLLANAM-DO |
International Classification(s)

- 2021 Application Filing Year
- H01L Class
- 28775 Applications Filed
- 15216 Patents Issued To-Date
- 52.88 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Jeon, Byung Du | Chungcheongnam-do, KR | 1 | 1 |
# of filed Patents : 1 Total Citations : 1 | |||
Kim, Sun Whan | Gyeonggi-do, KR | 7 | 39 |
# of filed Patents : 7 Total Citations : 39 |
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Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 2 Age
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3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Jun 26, 2027 |
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