Conductive polymer composition, coated product and patterning process
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United States of America Patent
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Dec 26, 2023
Grant Date -
Sep 17, 2020
app pub date -
Feb 26, 2020
filing date -
Mar 11, 2019
priority date (Note) -
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Abstract
An object of the present invention is to provide a conductive polymer composition which has good filterability and good film formability of a flat film on an electron beam resist and can be suitably used for an antistatic film for electron beam resist writing, showing excellent antistatic property in the electron beam writing process due to the property of low volume resistivity (Ω·cm), and, reducing an effect on lithography by making an effect of an acid diffused from the film minimum, and further having excellent peelability by H2O or an alkaline developer after writing.
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