Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin

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United States of America Patent

PATENT NO 11852970
APP PUB NO 20180246405A1
SERIAL NO

15754794

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Abstract

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A material for lithography containing a tellurium-containing compound or a tellurium-containing resin, a production method therefor, a composition for lithography, a pattern formation method, a compound, a resin, and a method for purifying the compound or the resin are provided. The compounds and materials can provide for high solubility in a safe solvent.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI GAS CHEMICAL COMPANY INCTOKYO 100-8324
A SCHOOL CORPORATION KANSAI UNIVERSITY3-35 YAMATE-CHO 3-CHOME SUITA-SHI OSAKA 564-8680

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Echigo, Masatoshi Tokyo, JP 137 625
Kudo, Hiroto Suita, JP 8 3
Sato, Takashi Hiratsuka, JP 973 9680
Toida, Takumi Hiratsuka, JP 22 64

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