Composition and method for creating nanoscale surface geometry on an implantable device
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United States of America Patent
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Dec 26, 2023
Grant Date -
Nov 19, 2020
app pub date -
May 13, 2020
filing date -
May 14, 2019
priority date (Note) -
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Abstract
Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and an amine, one or more chelating agents, and optionally iron (Fe) and/or certain component metals of the metal or alloy to be etched. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.
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