Patterning method and structures resulting therefrom

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United States of America Patent

PATENT NO 11848239
SERIAL NO

16925918

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Abstract

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A method includes depositing a first work function layer over a gate dielectric layer, forming a first hard mask layer over the first work function layer, forming a photoresist mask over the first hard mask layer, where forming the photoresist mask includes depositing a bottom anti-reflective coating (BARC) layer over the first hard mask layer, etching a portion of the BARC layer, etching a portion of the first hard mask layer using the BARC layer as a mask, etching a portion of the first work function layer to expose a portion of the gate dielectric layer through the first hard mask layer and the first work function layer, removing the first hard mask layer, and depositing a second work function layer over the first work function layer and over the portion of the gate dielectric layer.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chieh-Wei Taoyuan, TW 79 680
Chiang, Tzu-Ang I-Ian, TW 12 9
Lian, Jian-Jou Tainan, TW 44 34
Lin, Chun-Neng Hsinchu, TW 51 24
Yeh, Ming-Hsi Hsinchu, TW 153 567

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