Apparatus for edge trimming of semiconductor wafers

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United States of America Patent

PATENT NO 11848225
APP PUB NO 20230105086A1
SERIAL NO

18063516

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Abstract

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Methods and apparatus for pre-treating semiconductor wafers before edge trimming to enhance wafer edge quality prior to thinning the semiconductor wafers from an initial thickness, and increasing yield post-thinning of the pre-treated, edge trimmed semiconductor wafers. An apparatus includes a stage configured to receive one of a device wafer or a carrier wafer having a device wafer mounted thereto thereon, a laser tool located above the stage and oriented to direct a laser beam downwardly toward the stage, and a vertically movable blade rotatable about a horizontal axis along a radius from a vertical axis at a center of the device wafer and positionable proximate to and radially inward of an outer periphery of the device wafer.

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Patent Owner(s)

Patent OwnerAddress
MICRON TECHNOLOGY INCBOISE ID

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lin, Jing-Cheng Hsinchu, TW 575 17188

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