Cobalt sputtering target

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United States of America Patent

PATENT NO 11830711
APP PUB NO 20170236696A1
SERIAL NO

15514634

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Abstract

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A Co sputtering target having a purity of 99.99% to 99.999% and a Si content of 1 wtppm or less. Provided is a Co sputtering target capable of improving barrier properties and adhesiveness by suppressing conversion into highly reactive silicide by a reduction in the Si content in cobalt.

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Patent Owner(s)

Patent OwnerAddress
JX METALS CORPORATIONTOKYO 105-8417

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Asano, Takayuki Ibaraki, JP 14 63
Oda, Kunihiro Ibaraki, JP 32 319

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