Negative-type photosensitive resin composition, cured film, element and display device provided with cured film, and production method therefor

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United States of America Patent

PATENT NO 11822243
APP PUB NO 20190258164A1
SERIAL NO

16333449

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention provides a negative-type photosensitive resin composition capable of obtaining a cured film suppressing generation of development residues caused by a pigment and having high sensitivity and excellent heat resistance and light blocking capability. A negative-type photosensitive resin composition contains an alkali-soluble resin (A), a radical-polymerizable compound (B), a photopolymerization initiator (C1), and a pigment (D1). In this resin composition, the radical-polymerizable compound (B) contains a flexible chain-containing radical-polymerizable compound (B1), the flexible chain-containing radical-polymerizable compound (B1) contains a compound having (I) a structure derived from a compound having at least three hydroxyl groups in the molecule, (II) at least three ethylenically unsaturated double bond groups, and (III) at least one aliphatic chain, the aliphatic chain has an average molecular weight of 40 to 500, and the content of the pigment (D1) is 5 to 70 mass % of the total solid content.

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Patent Owner(s)

  • TORAY INDUSTRIES, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishikawa, Akihiro Otsu, JP 78 285
Miyoshi, Kazuto Otsu, JP 41 202
Tanigaki, Yugo Otsu, JP 19 85

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