Method of acquiring sample for evaluation of SiC single crystal

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United States of America Patent

PATENT NO 11815437
APP PUB NO 20200182752A1
SERIAL NO

16702180

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Abstract

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A method of acquiring a sample for evaluation of a SiC single crystal, comprising: a step of cutting a SiC ingot in a radial direction at a thickness position, which is located in a range from a curved surface which forms a distal end surface in a crystal growth direction to a seed crystal, to obtain a head member which includes the curved surface, wherein the SiC ingot used in the step is a SiC ingot in which SiC thereof is crystal-grown from a seed crystal along a c axis direction; and a step of polishing a silicon surface of the head member to obtain a sample for evaluation.

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Patent Owner(s)

Patent OwnerAddress
RESONAC CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Noguchi, Shunsuke Hikone, JP 11 1

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