Substrate processing apparatus

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United States of America Patent

PATENT NO 11791171
APP PUB NO 20200388511A1
SERIAL NO

16892321

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A substrate processing apparatus according to an aspect of the present disclosure includes a substrate rotating unit, a gas-liquid separator, and an exhaust route. The substrate rotating unit is configured to hold and rotate a substrate. The gas-liquid separator is provided so as to surround an outer circumference of the substrate rotating unit to separate gas and liquid droplets. The exhaust route is provided so as to surround an outer circumference of the gas-liquid separator and discharges the gas separated by the gas-liquid separator.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aiura, Kazuhiro Fukuoka, JP 21 85
Amano, Yoshifumi Fukuoka, JP 53 415

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