Extreme ultraviolet light generation apparatus and electronic device manufacturing method
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United States of America Patent
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Oct 17, 2023
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N/A
app pub date -
Aug 9, 2021
filing date -
Sep 16, 2020
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Abstract
An extreme ultraviolet light generation apparatus may include a chamber, a first partition wall covering a plasma generation region in the chamber and having a first opening, an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light generated in the plasma generation region and having passed through the first opening, a first gas supply port formed at the chamber and configured to supply gas to the first space, and a gas exhaust port formed in the first partition wall and configured to exhaust gas in a second space inside the first partition wall to outside of both the first partition wall and the chamber.
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