Exhaust module for wafer baking apparatus and wafer processing system having the same

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United States of America Patent

PATENT NO 11779871
APP PUB NO 20200197851A1
SERIAL NO

16661957

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Abstract

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The present disclosure provides an exhaust module for exhausting an exhaust from at least one wafer baking apparatus having an exhaust port. The exhaust module includes at least one pipeline, a heating unit, a solvent dispensing unit, and a filtering unit. The at least one pipeline is connected to the exhaust port of the wafer baking apparatus and configured to exhaust the exhaust gas from the wafer baking apparatus. The heating unit is connected to the pipeline and configured to heat the exhaust gas. The solvent dispensing unit is connected to the heating unit and configured to dispense a solvent to cool and dissolve the exhaust gas. The filtering unit is connected to the solvent dispensing unit and configured to filter the solvent.

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Patent Owner(s)

Patent OwnerAddress
XIA TAI XIN SEMICONDUCTOR (QING DAO) LTDSINO-GERMAN ECOPARK NO 172 TAIBAISHAN RD HUANGDAO DISTRICT QINGDAO CITY QINGDAO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jang, Sungkun Singapore, SG 5 2
Kwon, Byung-In Singapore, SG 9 1
Lim, Jong-Kill Singapore, SG 8 6

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