Method of determining control parameters of a device manufacturing process

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United States of America Patent

PATENT NO 11768442
APP PUB NO 20230058839A1
SERIAL NO

17973221

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Abstract

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A method including: obtaining an image of at least part of a substrate, wherein the image includes at least one feature of a device being manufactured in a layer on the substrate; obtaining a layout of features associated with a previous layer adjacent to the layer on the substrate; calculating one or more image-related metrics in dependence on: 1) a contour determined from the image including the at least one feature and 2) the layout; and determining one or more control parameters of a lithographic apparatus and/or one or more further processes in a manufacturing process of the device in dependence on the one or more image-related metrics, wherein at least one of the control parameters is determined to modify the geometry of the contour in order to improve the one or more image-related metrics.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VDE RUN 6501 VELDHOVEN NL-5504 DR

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Anunciado, Roy Eindhoven, NL 8 24
Jochemsen, Marinus Veldhoven, NL 28 162
Maslow, Mark John Eindhoven, NL 16 62
Slachter, Abraham Waalre, NL 11 27
Staals, Frank Eindhoven, NL 64 340
Tel, Wim Tjibbo Helmond, NL 78 537
Van, Gorp Simon Hendrik Celine Oud-Turnhout, BE 12 18
Van, Ingen Schenau Koenraad Veldhoven, NL 8 11
Warnaar, Patrick Tilburg, NL 61 794

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