Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry

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United States of America Patent

PATENT NO 11764050
APP PUB NO 20230091625A1
SERIAL NO

17821785

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Abstract

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Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

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Patent Owner(s)

Patent OwnerAddress
NOVA MEASURING INSTRUMENTS INC3090 OAKMEAD VILLAGE DRIVE SANTA CLARA CA 95051

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bevis, Chris Los Gatos, US 8 9
Newcome, Bruce H Sunnyvale, US 12 60
Reed, David A Belmont, US 53 655
Schueler, Bruno W San Jose, US 20 206
Smedt, Rodney Los Gatos, US 27 572

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