Extreme ultraviolet mask blank with multilayer absorber and method of manufacture

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United States of America Patent

PATENT NO 11754917
SERIAL NO

17227717

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Abstract

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Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber layers including a plurality of absorber layer pairs.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jindal, Vibhu San Jose, US 83 312

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