Substrate holder for use in a lithographic apparatus

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United States of America Patent

PATENT NO 11749556
SERIAL NO

17481978

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Abstract

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A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VDE RUN 6501 VELDHOVEN NL - 5504 DR

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baggen, Mark Constant Johannes Eindhoven, NL 13 38
Kramer, Gijs Nijmegen, NL 19 12
Ravensbergen, Simon Karel Veldhoven, NL 7 5
Roset, Niek Jacobus Johannes Eindhoven, NL 31 219
Timmermans, Roger Anton Marie Nederweert, NL 11 20
Van, Den Berkmortel Frank Pieter Albert Deurne, NL 7 7
Vermeulen, Marcus Martinus Petrus Adrianus Leende, NL 23 72

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