Method for making photolithography mask plate
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United States of America Patent
Stats
-
Sep 5, 2023
Grant Date -
May 27, 2021
app pub date -
Jan 8, 2021
filing date -
Dec 1, 2016
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method of making photolithography mask plate is provided. The method includes: providing a chrome layer on a substrate; depositing a carbon nanotube layer on the chrome layer to expose a part of a surface of the chrome layer; etching the chrome layer with the carbon nanotube layer as a mask to obtain a patterned chrome layer; and depositing a cover layer on the carbon nanotube layer.
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International Classification(s)
- 2021 Application Filing Year
- G03F Class
- 1993 Applications Filed
- 1000 Patents Issued To-Date
- 50.18 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G03F Class
- 0 % this patent is cited more than
- 2 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Mar 5, 2027 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Mar 5, 2031 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Mar 5, 2035 |
