Electrode configuration for extended plasma confinement

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11744001
APP PUB NO 20220394840A1
SERIAL NO

17841593

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Methods and systems are provided for plasma confinement utilizing various electrode and valve configurations. In one example, a device includes a first electrode positioned to define an outer boundary of an acceleration volume, a second electrode arranged coaxially with respect to the first electrode and positioned to define an inner boundary of the acceleration volume, at least one power supply to drive an electric current along a Z-pinch plasma column between the first second electrodes, and a set of valves to provide gas to the acceleration volume to fuel the Z-pinch plasma column, wherein an electron flow of the electric current is in a first direction from the second electrode to the first electrode. In additional or alternative examples, a shaping part is conductively connected to the second electrode to, in a presence of the gas, cause a gas breakdown of the gas to generate a sheared flow velocity profile.

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Patent Owner(s)

Patent OwnerAddress
ZAP ENERGY INC506 SECOND AVENUE SUITE 1400 SEATTLE WA 98104

International Classification(s)

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  • 2022 Application Filing Year
  • H05H Class
  • 245 Applications Filed
  • 73 Patents Issued To-Date
  • 29.80 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Meier, Eric T Seattle, US 6 28
Nelson, Brian A Edmonds, US 14 92
Shumlak, Uri Seattle, US 14 93

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Patent Citation Ranking

  • 3 Citation Count
  • H05H Class
  • 86.13 % this patent is cited more than
  • 2 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges3295301 - 10020406080100120140160180200220240260280300320340360

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