Perhydropolysilazane compositions and methods for forming oxide films using same

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United States of America Patent

PATENT NO 11739220
APP PUB NO 20210087406A1
SERIAL NO

16971869

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Abstract

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A Si-containing film forming composition comprising a catalyst and/or a polysilane and a N—H free, C-free, and Si-rich perhydropolysilazane having a molecular weight ranging from approximately 332 dalton to approximately 100,000 dalton and comprising N—H free repeating units having the formula [—N(SiH3)x(SiH2-)y], wherein x=0, 1, or 2 and y=0, 1, or 2 with x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 with x+y=3. Also disclosed are synthesis methods and applications for using the same.

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Patent Owner(s)

Patent OwnerAddress
L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDEPARIS FRANCE PARIS PARIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Girard, Jean-Marc Versailles, FR 121 3273
Husson, Guillaume Newark, US 13 21
Itov, Gennadiy Flemington, US 28 1456
Kerrigan, Sean Princeton, US 12 40
Khandelwal, Manish Somerset, US 36 1503
Kuchenbeiser, Glenn Fremont, US 25 993
Nikiforov, Grigory Bridgewater, US 22 306
Orban, David Hampton, US 7 309
Pesaresi, Reno Easton, US 12 1435
Ritter, Cole Easton, US 7 21
Sanchez, Antonio Tsukuba, JP 46 1862
Stephens, Matthew Damien Morristown, US 12 323
Wan, Zhiwen Plano, US 19 47
Wang, Yang Garnet Valley, US 887 5589
Zhang, Peng Branchburg, US 846 8792

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