EUV in-situ linearity calibration for TDI image sensors using test photomasks
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United States of America Patent
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Aug 22, 2023
Grant Date -
Dec 24, 2020
app pub date -
Jun 12, 2020
filing date -
Jun 20, 2019
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Abstract
To calibrate a TDI photomask inspection tool, a photomask with a plurality of distinctly patterned regions is loaded into the tool. The plurality of distinctly patterned regions is successively illuminated with an EUV beam of light. While illuminating respective distinctly patterned regions, respective instances of imaging of the respective distinctly patterned regions are performed using a TDI sensor in the inspection tool. While performing the respective instances of imaging, a reference intensity detector is used to measure reference intensities of EUV light collected from the photomask. Based on the results of the respective instances of imaging and the measured reference intensities of EUV light, linearity of the TDI sensor is determined.
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