Device and method for analyzing a defect of a photolithographic mask or of a wafer

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11733186
APP PUB NO 20210247336A1
SERIAL NO

17220330

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Abstract

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The present application relates to a scanning probe microscope comprising a probe arrangement for analyzing at least one defect of a photolithographic mask or of a wafer, wherein the scanning probe microscope comprises: (a) at least one first probe embodied to analyze the at least one defect; (b) means for producing at least one mark, by use of which the position of the at least one defect is indicated on the mask or on the wafer; and (c) wherein the mark is embodied in such a way that it may be detected by a scanning particle beam microscope.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baralia, Gabriel Dieburg, DE 9 25
Baur, Christof Darmstadt, DE 44 310
Budach, Michael Hanau, DE 38 159
Edinger, Klaus Lorsch, DE 35 425
Hofmann, Thorsten Rodgau, DE 22 184

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