Cleaning solution composition and cleaning method using the same

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United States of America Patent

PATENT NO 11732217
SERIAL NO

17381211

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Abstract

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A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.

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Patent Owner(s)

Patent OwnerAddress
KCTECH CO LTD30 JE2GONGDAN 3-GIL MIYANG-MYEON ANSEONG-SI GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jeong, Yong Ho Gyeonggi-do, KR 3 0
Jung, Kyong Jin Gyeonggi-do, KR 2 0
Park, Kun Hee Gyeonggi-do, KR 4 0
Yun, Young Ho Gyeonggi-do, KR 6 4

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