Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

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United States of America Patent

PATENT NO 11725282
SERIAL NO

17445562

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Abstract

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A method for operating a substrate processing system includes delivering precursor gas to a chamber using a showerhead that includes a head portion and a stem portion. The head portion includes an upper surface, a sidewall, a lower planar surface, and a cylindrical cavity and extends radially outwardly from one end of the stem portion towards sidewalls of the chamber. The showerhead is connected, using a collar, to an upper surface of the chamber. The collar is arranged around the stem portion. Process gas is flowed into the cylindrical cavity via the stem portion and through a plurality of holes in the lower planar surface to distribute the process gas into the chamber. A purge gas is supplied through slots of the collar into a cavity defined between the head portion and an upper surface of the chamber.

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Patent Owner(s)

Patent OwnerAddress
NOVELLUS SYSTEMS INC4000 NORTH FIRST STREET SAN JOSE CALIFORNIA 95134 95134

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Augustyniak, Edward J Tualatin, US 9 67
Chandrasekharan, Ramesh Portland, US 84 4837
Keil, Douglas West Linn, US 50 530
Leeser, Karl Frederick West Linn, US 61 67
Xia, Chunguang Tualatin, US 30 555

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